CVD System

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Two Channel Desktop Anti-Corrosion Gas Mixer with Float Flow Control CY-2F
Two Channel Desktop Anti-Corrosion Gas Mixer with Float Flow Control CY-2F Image

1.Semiconductor manufacturing industry
2.Vacuum coating equipment
3.Special material surface treatment
4.Gas combustion control
5.Leakage detection system
6.Environment detection and analysis equipment
7.Chemical, petrochemical, metallurgy, optical fiber etc

Three Channel Compact Anti-Corrosion Gas Mixer with Float Flow Control CY-3F
Three Channel Compact Anti-Corrosion Gas Mixer with Float Flow Control CY-3F Image

1.Semiconductor manufacturing industry

2.Vacuum coating equipment

3.Special material surface treatment

4.Gas combustion control

5.Leakage detection system

6.Environment detection and analysis equipment

7.Chemical, petrochemical, metallurgy, optical fiber and etc

Compact CVD Tube Furnace with 2"OD Quartz tube furnace and 3 gas mixer CY-O1200-50IS-3Z10V
Compact CVD Tube Furnace with 2"OD Quartz tube furnace and 3 gas mixer CY-O1200-50IS-3Z10V Image

This CY-O1200-50IS-3Z10V compact cvd tube furnace is combined with a mini tube furnace, a 3 gas way mixer station and one two stage rotary vacuum pump. It is desiged for laboratory thin film preparation and small sample high temperature annealing

Anti-Corrosion Three Channel Gas Mixing Control(MFC) Station for CVD System CY-3Z
Anti-Corrosion Three Channel Gas Mixing Control(MFC) Station for CVD System CY-3Z Image

    1.Variety gas way for option

    2.304 stainless steel pipe core, corrosion resistance

    3.Stainless steel double card quick connector, easy to connect, and no leakage

Laboraotry mini pecvd furnace with compact tube furnace,rf generator and gas mixer-CY-O1200-50IS-PECVD
Laboraotry mini pecvd furnace with compact tube furnace,rf generator and gas mixer-CY-O1200-50IS-PECVD Image

CY-O1200-50IS-PECVD is a CE certified splittable single zone tube furnace with 60mm diameter quartz tube, mechanical vacuum pump and four channel gas flowing system and a 13.56MHz rf generator.It can achieve a maximum vacuum up to 10-2 torr and mix 1-4 types of gases for CVD or diffusion.It is widely used for laboratory thin film preparation

Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation
Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation Image

    1.Regional refinding for semiconductor of germanium and silicon

    2.CVD experiment

    3.Preparation of carbon nanotubes

    4.Growth of graphene

    5.Crystalline silicon substrate coating

    6.Diffusion welding for metal materials

    7.Heat treatment under the vacuum of atmosphere surroundings

Laboratory High Pressure &Temperature Tube furnace with Three Gas way mixer-CY-FH-S150
Laboratory High Pressure &Temperature Tube furnace with Three Gas way mixer-CY-FH-S150 Image

High temperature high pressure sintering furnace is mainly used for special functional ceramics powder or certain density sample’s heat treatment which need high pressure about 20 MPa, to realize ceramic material high pressure sintering.

1.PC and PID Programmable control, easy operation

2.Over pressure &over temperature protective, make sure user’s safety

3.Compact structure with mobile carrier, easy move and using.

Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F
Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F Image

This compact cvd system is composed by a mini tube furnace, a rotary vacuum pump, a 3 gas way float flow controller and a digital vacuum gauge. This compact cvd system is widely used in laboratory thin film preparation, such as MoS2, graphene etc.

Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V
Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V Image

CY-O1200-50IT-2Z10V is a laboratory cvd furnace composed by one 1200℃ tube furnace with water cooling system, a two way gas mixer, and rotary vacuum pump. It is designed for laboratory thin film preparation, such as: graphene, MoS2, Nanotube and etc

Laboratory 1200°C CVD Tube Furnace with 4 Channel MFC Gas Mixer and Vacuum Pump CY-O1200-60IT-4Z10V
Laboratory 1200°C CVD Tube Furnace with 4 Channel MFC Gas Mixer and Vacuum Pump CY-O1200-60IT-4Z10V Image

CY-O1200-60IT-4Z10V is a CE certified splittable single zone tube furnace with 60mm diameter quartz tube, mechanical vacuum pump and four channel gas flowing system. It can achieve a maximum vacuum up to 10-2 torr and mix 1-4 types of gases for CVD or diffusion.It is widely used for laboratory thin film preparation

Two Channel Desktop Anti-Corrosion Gas Mixer with Float Flow Control CY-2F Image
Two Channel Desktop Anti-Corrosion Gas Mixer with Float Flow Control CY-2F
1.Semiconductor manufacturing industry 2.Vacuum coating equipment 3.Special material surface treatment 4.Gas combustion control 5.Leakage detection system 6.Environment detection and analysis equipment... Read More
Specifications:

Model No.

CY-2F

Flow meter type

float flow control

Flow meter pipe core material

304 stainless steel

Valve type

electromagnetic regulating valve

Pipeline normal condition

close

Gas way

2 gas way

Connector size

1/4"

Pressure range

-0.1~0.15Mpa

A way range

10~100ml

B way range

16~160ml

flow control range

2%-100%

Working temperature

15-50℃

Working power

AC 220V 50-60Hz

Three Channel Compact Anti-Corrosion Gas Mixer with Float Flow Control CY-3F Image
Three Channel Compact Anti-Corrosion Gas Mixer with Float Flow Control CY-3F
1.Semiconductor manufacturing industry 2.Vacuum coating equipment ... Read More
Specifications:

Model no.

CY-3F

Flow meter type

float flow control

Flow meter pipe core material

304 stainless steel

Valve type

electromagnetic regulating valve

Pipeline normal condition

close

Gas way

3 gas way

Connector size

1/4"

Pressure range

-0.1~0.15Mpa

A way range

0-100ml

B way range

16~160ml

C way range

25~250ml

flow control range

2%-100%

Working temperature

15-50℃

Working power

AC 220V 50-60Hz

Compact CVD Tube Furnace with 2"OD Quartz tube furnace and 3 gas mixer CY-O1200-50IS-3Z10V Image
Compact CVD Tube Furnace with 2"OD Quartz tube furnace and 3 gas mixer CY-O1200-50IS-3Z10V
This CY-O1200-50IS-3Z10V compact cvd tube furnace is combined with a mini tube furnace, a 3 gas way mixer station and one two stage rotary vacuum pump. It is desiged for laboratory thin film preparation and small sample high temperature ... Read More
Specifications:

Model No.

CY-O1200-50IS-3Z10V

Display

LED digital gauge

Limiting temperature

1200℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

200mm, constant temperature zone:80mm

Quartz tube diameter

OD50*700mm

Temperature accuracy

± 1℃

Heating element

Fe-Cr-Al alloy adopt by Mo

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Vacuum pump

Mechanical rotary vacuum pump:10-2Torr
Turbo pump with rotary vacuum pump:10-5Torr

Cooling method

Air cooling

Connection pipe

stainless steel bellows, manual flap valve

Gas Mixer

3 way gas mixer

Working pressure:

-0.1MPa~0.15MPa

MFC1 Range

0~100SCCM

MFC2 Range

0~200SCCM

MFC3 Range

0~500SCCM

Working voltage

AC220V,50Hz

Anti-Corrosion Three Channel Gas Mixing Control(MFC) Station for CVD System CY-3Z Image
Anti-Corrosion Three Channel Gas Mixing Control(MFC) Station for CVD System CY-3Z
1.Variety gas way for option 2.304 stainless steel pipe core, corrosion resistance ... Read More
Specifications:

Model no.

CY-3Z

Flow meter type

mass flow

Flow meter pipe core material

304 stainless steel

Valve type

electromagnetic regulating valve

Pipeline normal condition

close

Gas way

3 gas way

Connector size

1/4"

Measurement accuracy

±1.0%F.S

Linearity

±0.5%F.S

Repeat accuracy

±0.2%F.S

Pressure range

-0.1~0.15Mpa

A way range

0~100SCCM

B way range

0~200SCCM

C way range

0~500SCCM

flow control range

2%-100%

Zero temperature drift

0.6F.S(15-35℃)

Respond time

2S

Working temperature

15-50℃

Working power

AC 220V 50-60Hz

Laboraotry mini pecvd furnace with compact tube furnace,rf generator and gas mixer-CY-O1200-50IS-PECVD Image
Laboraotry mini pecvd furnace with compact tube furnace,rf generator and gas mixer-CY-O1200-50IS-PECVD
CY-O1200-50IS-PECVD is a CE certified splittable single zone tube furnace with 60mm diameter quartz tube, mechanical vacuum pump and four channel gas flowing system and a 13.56MHz rf generator.It can achieve a maximum vacuum up to 10-2 t... Read More
Specifications:

Model No.

CY-O1200-50IS-PECVD

RF frequency

13.56 MHz 0.005% stability

Reflection Power

200W max

Output Power

5 -300W adjustable with ±1% stability

RF Output Port

50 Ω, N-type, female

Matching

Automatic

Display

LED digital gauge

Limiting temperature

1200℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

200mm, constant temperature zone:80mm

Quartz tube diameter

OD50*1000mm

Temperature accuracy

± 1℃

Heating element

Fe-Cr-Al alloy adopt by Mo

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Vacuum pump

Mechanical rotary vacuum pump:10-2Torr
Turbo pump with rotary vacuum pump:10-5Torr

Cooling method

Air cooling

Connection pipe

stainless steel bellows, manual flap valve

Gas Mixer

4 way gas mixer

Accuracy

±2%F.S.

Repeat accuracy

±0.2% FS

Linear precision

±1%F.S.

Working pressure:

-0.1MPa~0.15MPa

MFC1 Range

0~100SCCM

MFC2 Range

0~200SCCM

MFC3 Range

0~200SCCM

MFC4 Range

0~500SCCM

Working voltage

AC220V,50Hz

Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation Image
Sliding 1200 degree Tube Furnace with three gas mixer,vacuum pump for CNT Preparation
1.Regional refinding for semiconductor of germanium and silicon 2.CVD experiment 3.Preparation of carbon nanotubes 4.Growth of graphene 5.Crystalline silicon substrate coating 6.Diffusion welding f... Read More
Specifications:1.Fast heating and cooling, maximum rate: 0-100°c/min
2.Multi-function: CVD experiment, growth of graphene, crystalline silicon substrate coating,etc.
3.LED display or LCD touch screen
4.Slide type, can manual sliding or electric sliding
5.Can connect with vacuum pump and atmosphere furnace.

Model

CY-T1200-80IC

Display

LED

Limiting temperature

1200℃

Working temperature

≤1200℃

Heating rate

Suggestion 0~20℃/min

Temperature zone

Single

Temperature accuracy

±1℃

Chamber size

Φ80×1200(mm)

Heated length

440mm

Furnace structure

High purity Al2O3 insulation chamber
guarantees excellent temperature uniformity.

Cooling fans are installed at the
bottom of the furnace to ensure efficient ventilation.

Sliding flange assembly are made of stainless steel.

Heating element

Imported alloy heating wire

Thermal couple

K Type

Rated power

1.5 Kw

Temperature control

PID automatic control via SCR power control

Chamber material

Alumina Fiber

Flange connection

Stainless steel flange

Sliding Rail

800mm long sliding rail is installed with one
end flange to make loading & unload sample easy.

Mass Flow meters

Three precision mass flow meters (0.02% accuracy) with
digital display are installed on
the bottom case to control gas flow rate automatically.

MFC 1: Gas flow range from 0~100 sccm

MFC 2 : Control range from 0~200 sccm

MFC 3 : Control range from 0~200 sccm

Flowing rate accuracy: ±1% FS

Each gas channle has a SS needle valve for easy on/off

The flow rate is adjustable from the MFC panel

Vacuum pump and valve

Pumping rate: 8m3/h 50Hz; 9.6m3/h 60Hz.

Vacuum degree:10Pa

KFD25 adapter and stainless steel pipe are connected
between pump and tube flange with precision ball valve

Working voltage

AC110-480V 50/60 Hz

Laboratory High Pressure &Temperature Tube furnace with Three Gas way mixer-CY-FH-S150 Image
Laboratory High Pressure &Temperature Tube furnace with Three Gas way mixer-CY-FH-S150
High temperature high pressure sintering furnace is mainly used for special functional ceramics powder or certain density sample’s heat treatment which need high pressure about 20 MPa, to realize ceramic material high pressure sinterin... Read More
Specifications:

Model

CY-FH-S150

Process Vessels

Ni-based super-alloy ID50 x OD 60 x Length 1000 (mm)

Copper gasket

For 60mm O.D tube: 82 O.D x 63.6 I.D x 2.2mm

Working Pressure vs.
     Working
     Temperature

15 Mpa max. at ≤800°C
     10 Mpa max. at ≤900°C
     5 Mpa max. at ≤1000°C
     2.5 Mpa max. at 1100°C
   Attention: Never heat up above 1100°C

Working Gases

Inert gas and oxygen, etc

Heating Temperature

1100°C max.for < 1hr 1000C for continuous

Heating Rate

≤20°C/min

Heating Element

Resistance wire

Heating Zone

Total length: 440mm Single zone
   Constant temp. zone: 150mm ±1°C

Temperature Control

PID control method with over-temp protection
     Temperature stability: ±1°C
   Touch screen controller with LCD display

Thermocouple

K type

Pressure Measurement Range

0~15Mpa

Pressure safety device

1)high pressure sensor installed in high-pressure flange

2)high pressure solenoid valve controlled by pressure monitor

3)automatic gas release port

4)pressure transducer

5)manual valve for disconnect solenoid

PC control

Temperature & Pressure,

Show the screen of software by English version

brand new Laptop (optional)

Pressure Alarm System

Upper limit and lower limit control method
   Alarm strobe and warning whistle

Standard Accessories

high pressure super-alloy furnace tube, 1ea

high pressure sealing flanges and the related accessories like copper O-rings, screws, 1set

high pressure solenoid valve and pressure transducer, 1set

dust free protective gloves, 1 pair

tube blocks, 1 pair

furnace hook, 1ea

quartz boat, 1ea

Additional spare parts

spare copper O-ring

high pressure superalloy furnace tube

Power

AC 220V 50/60Hz, 4.5KW 

Shipping package Dimension

1120*1120*900mm

Shipping weight

Around 210kg

Warranty

1 year

Certificate

CE

Operation Instructions

operating manual by English version

Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F Image
Compact CVD system with 1200°C tube furnace 3 gas way float flow controller-CY-O1200-50IC-3F
This compact cvd system is composed by a mini tube furnace, a rotary vacuum pump, a 3 gas way float flow controller and a digital vacuum gauge. This compact cvd system is widely used in laboratory thin film preparation, such as MoS2, gra... Read More
Specifications:
Furnaceparameters
FurnaceConstruction•Highpurityceramicfiberinsulation(energysaving30%andweight
lighterabout30%thanoldfurnace).
•Doublelayerssteelcasingwithfancooling,toensurethe
surfaceoffurnacebelow50°C.
•Perfectsealingstainlesssteelflangewithblock.
ChamberSizeΦ50*1000mm,Φ60*1000mm,Φ80*1000mm,Φ100*1000mm
orascustomized
Power0.8KW~10KW,baseontheheatingzonelength
VoltageAC220V50/60Hz
Max.Temperature1200°C(<2hour)
ContinuousWorkTemp.1150°C
Max.HeatingRate20°C/min
TemperatureController•PIDautomaticcontrolandauto-tunefunction.
•30programmablesegmentsforprecisecontrol.
•Over-heatedandbrokenThermalcouple.
•DigitalcontrolpanelLEDbuttonorLCDtouchscreen
TemperatureAccuracy+/-1°C
HeatingElementAludirome
ThermalCoupleKtype
VacuumPump·AC220V50Hz1/2HP375W
·2Liter/Sor120liter/m
·Oiltrap(inlet)andexhaustfilter(outlet)areinstalled.
·Max.vacuum:10-2torr
Float Flow Control3 gas way
16~160,25~250,60~600ml/min as customized
WarrantyOneyearlimitedwarranty(Consumablepartssuchasthermocouple,doorblockandheatingelements
Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V Image
Laboratory CVD Furnace with water cooling flange and two gas way mixer CY-O1200-50IT-2Z10V
CY-O1200-50IT-2Z10V is a laboratory cvd furnace composed by one 1200℃ tube furnace with water cooling system, a two way gas mixer, and rotary vacuum pump. It is designed for laboratory thin film preparation, such as: graphene, MoS2, Na... Read More
Specifications:

Model No.

CY-O1200-50IT-2Z10V

Display

LCD Touch Panel

Limiting temperature

1200℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

440mm, constant temperature zone:200mm

Quartz tube diameter

OD50*1000mm, 60/80/100/120mm for option

Temperature accuracy

± 1℃

Heating element

Fe-Cr-Al alloy adopt by Mo

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Over-temperature alarm

Yes

Over-current alarm

Yes

Sealing flange

Water cooling S.S vacuum flange

Vacuum pump

Mechanical rotary vacuum pump

Cooling method

Air cooling

Connection pipe

stainless steel bellows, manual flap valve

Gas Mixer

2 way gas mixer

Accuracy

±2%F.S.

Repeat accuracy

±0.2% FS

Linear precision

±1%F.S.

Working pressure:

-0.1MPa~0.15MPa

MFC1 Range

0~100SCCM

MFC2 Range

0~200SCCM

Working voltage

AC220V,50Hz

Laboratory 1200°C CVD Tube Furnace with 4 Channel MFC Gas Mixer and Vacuum Pump CY-O1200-60IT-4Z10V Image
Laboratory 1200°C CVD Tube Furnace with 4 Channel MFC Gas Mixer and Vacuum Pump CY-O1200-60IT-4Z10V
CY-O1200-60IT-4Z10V is a CE certified splittable single zone tube furnace with 60mm diameter quartz tube, mechanical vacuum pump and four channel gas flowing system. It can achieve a maximum vacuum up to 10-2 torr and mix 1-4 types of ga... Read More
Specifications:

Model No.

CY-O1200-60IT-4Z10V

Display

LCD Touch Panel

Limiting temperature

1200℃

Working temperature

≤1100℃

Heating rate

0-20℃/min

Heating Zone length

440mm, constant temperature zone:200mm

Quartz tube diameter

OD60*1000mm

Temperature accuracy

± 1℃

Heating element

Fe-Cr-Al alloy adopt by Mo

Thermal couple

K TYPE

Cooling method

Double layer structure with fan cooling

Temperature control

30 steps programmable PID control

Chamber material

Alumina fiber

Over-temperature alarm

Yes

Over-current alarm

Yes

Sealing flange

S.S vacuum flange

Vacuum pump

Mechanical rotary vacuum pump(optional)

Cooling method

Air cooling

Connection pipe

stainless steel bellows, manual flap valve

Gas Mixer

4 way gas mixer

Accuracy

±2%F.S.

Repeat accuracy

±0.2% FS

Linear precision

±1%F.S.

Working pressure:

-0.1MPa~0.15MPa

MFC1 Range

0~100SCCM

MFC2 Range

0~200SCCM

MFC3 Range

0~200SCCM

MFC4 Range

0~500SCCM

Working voltage

AC220V,50Hz