Lab Coating Equipment

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DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor Image

VTC-600-2HD is a compact magnetron sputtering system with dual 2″ target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide

  • Model NO.: CY-VTC-600-2HD

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Measurement Type

  • RF Source: 600W

  • Gas Flow Control: Mass Flow Meter

  • Trademark: CY

  • Specification: 300 mm Dia x 300 mm height

  • HS Code: 85141090

  • Customized: Customized

  • Material: Stainless Steel

  • Application: Lab

  • DC Source: 500W

  • Vacuum Chamber: Stainless Steel

  • Warranty: One Year

  • Transport Package: Wooden Box

  • Origin: Zhengzhou, China

Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-Ktq-100
Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-Ktq-100 Image

Description of the micrometer adjustable film applicator:Adjustable Film Applicator – This unique wet film applicator features micrometer heads for knife blade adjustment.

  • Model NO.: EQ-Se-KTQ-100

  • Structure: Desktop

  • Certification: CE, ISO

  • Type: Film Casting Doctor Blade

  • Trademark: CYKY

  • Specification: Film casting doctor blade

  • Customized: Customized

  • Material: Stainless Steel

  • Application: School, Lab

  • Film Applicator: Film Casting Doctor Blade

  • Transport Package: Wooden Case

  • Origin: China

4 Paths Micron Precision Film Applicator Cy-EQ-Se-Ktq-4s
4 Paths Micron Precision Film Applicator Cy-EQ-Se-Ktq-4s Image

Zhengzhou CY Scientific Instrument Co., Ltd.-founded in 2013 is a high and new technology enterprise registered in Zhengzhou,Henan province. We mainly supply the lab instruments for material research in labs like the cutting machine, milling machine, polishing machine, sintering furnace, mixing machine, glove box, film coating machine, etc.

  • Model NO.: EQ-Se-KTQ-4S

  • Structure: Desktop

  • Certification: CE

  • Type: Film Applicator

  • Trademark: CYKY

  • Specification: Film Applicator

  • Customized: Non-Customized

  • Material: Stainless Steel

  • Application: School, Lab

  • Item Name: Film Applicator

  • Transport Package: Wooden Case

  • Origin: China

Micrometer Adjustable Film Applicator - 50 mm (Film Casting Knife) - EQ-Se-Ktq-50
Micrometer Adjustable Film Applicator - 50 mm (Film Casting Knife) - EQ-Se-Ktq-50 Image

Micrometer Adjustable Film Applicator – 50 mm (Film Casting Knife) – EQ-Se-Ktq-50

  • Model NO.: EQ-Se-KTQ-50

  • Structure: Desktop

  • Certification: CE, ISO

  • Type: Film Applicator – 50 mm

  • Trademark: CYKY

  • Specification: Film Applicator

  • Customized: Non-Customized

  • Material: Stainless Steel

  • Application: School, Lab

  • Item Name: Film Applicator – 50 mm

  • Transport Package: Wooden Case

  • Origin: China

Gold, Platinum, Indium and Silver Plasma Sputtering Coater
Gold, Platinum, Indium and Silver Plasma Sputtering Coater Image

This is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver etc which can be applied on a sample up to 50 mm diameter with 300 Angstrom thickness.

  • Model NO.: CY-GSL1100X-SPC16

  • Coating: Vacuum Coating

  • Certification: CE

  • Trademark: CYKY

  • Origin: China

  • Type: Plasma Sputtering Coater

  • Substrate: Gold, Silver, Indium etc

  • Condition: New

  • Transport Package: Wooden Case

Low Vacuum Laboratory Mini CVD Tube Furnace with Three Gas Channels
Low Vacuum Laboratory Mini CVD Tube Furnace with Three Gas Channels Image
  • Model NO.: CY-1200CVD 

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Heating Type

  • Tube Material: High Purity Quartz

  • Chamber Material: Alumina Fiber

  • Thermcouple: K Type

  • Trademark: CY

  • Specification: OD. 60mm

  • HS Code: 85141090

  • Customized: Customized

  • Material: Steel

  • Application: School

  • Heating Zone: Single

  • Accuracy: +/-1c

  • Heating Element: Resistance Wire

  • Warranty: One Year

  • Transport Package: Wooden Box

  • Origin: Zhengzhou, China

1200c Compact Magnet Driven Sliding Tube Furnace for Two Dimension Material
1200c Compact Magnet Driven Sliding Tube Furnace for Two Dimension Material Image
  • Model NO.: CY-OTF-1200X-S-DVD 

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Heating Type

  • Max.Heating Rate: =<20c/Min.

  • Heating Element: Resistance Wire

  • Tube Size: Customized

  • Trademark: CY

  • Specification: OD. 50mm

  • HS Code: 85141090

  • Customized: Customized

  • Material: Steel

  • Application: Lab

  • Max.Temperature: 1200c

  • Temperature Accuracy: +/-1c

  • Vacuum Flange: Stainless Steel

  • Warranty: One Year

  • Transport Package: Wooden Box

  • Origin: Zhengzhou, China

Split Type Max Dual Sliding Rtp Tube Furnace for Molybdenum Disulfide (MOS2) Research
Split Type Max Dual Sliding Rtp Tube Furnace for Molybdenum Disulfide (MOS2) Research Image

This set of equipment is split vacuum tube furnace and the front end is equipped with pre – heater heated to 400 ºC, the auxiliary sulfur powder evaporation, the rear end of the dual-zone curing oven, precise temperature control, easy to operate. .The left side is equipped with a flange support,preheater and sulphur furnace can be used separately.

Ultra-High Vacuum Thermal Evaporation Coater with Four Heating Sources (10-6 torr)
Ultra-High Vacuum Thermal Evaporation Coater with Four Heating Sources (10-6 torr) Image

GSL-1800X-ZF4 is a ultra-vacuum evaporation coater designed for coating oxygen sensitive metallic materials, such as Ti, Al, and Ir etc. It also can be used for coating all kinds of materials. It has four evaporation heater sources and coat two type of materials at the same time at high vacuum up to 10-6 torr. It is an excellent and cost-effective coating machine for research labs.

  • Model NO.: GSL-1800X-ZF4

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Plasma

  • Transport Package: Ply Wooden Carton

  • HS Code: 8486109000

  • Customized: Customized

  • Material: Steel

  • Application: School, Lab

  • Trademark: CYKY

  • Origin: Zhengzhou, China

Multi-Function Coater: Plasma Sputtering+Evaporating+Carbon Coating with Turbo Hi-Vacuum System
Multi-Function Coater: Plasma Sputtering+Evaporating+Carbon Coating with Turbo Hi-Vacuum System Image

GSL-1800X-SBC2 is a floor-stand Multi-Function Film Coater, which integrates thermal evaporating, carbon coating and plasma sputtering coating into one machine and it can provide the coating for almost every material, including metallic, semiconductive and insulating materials. It is an excellent and cost-effective coating machine for research labs.

  • Model NO.: GSL-1800X-SBC2

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Plasma

  • Transport Package: Ply Wooden Carton

  • HS Code: 8486109000

  • Customized: Customized

  • Material: Steel

  • Application: School, Lab

  • Trademark: CYKY

  • Origin: Zhengzhou, China

3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option
3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option Image

VTC-3RF is a three head 1″ RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC

  • Model NO.: CY-VTC-3RF

  • Structure: Desktop

  • Certification: CE, TUV

  • Type: Plasma

  • Transport Package: Ply Wooden Carton

  • HS Code: 8486109000

  • Customized: Customized

  • Material: Steel

  • Application: School, Lab

  • Trademark: CYKY

  • Origin: Zhengzhou, China

Compact Mini Vacuum Carbon Metal Evaporation Coater
Compact Mini Vacuum Carbon Metal Evaporation Coater Image

Compact Vacuum Carbon & Metal Evaporating Coater machine Brief introduction CY-1100X-SPC-5E is a compact evaporating coater, which is suitable for coating light metal,
Al. Mg, and Li as well as carbon film to sample upto 2″

  • Model NO.: CY-1100X-SPC-15E 

  • Coating: Vacuum Coating

  • Certification: CE, TUV

  • Specimen Chamber: Fused Glass Tube

  • Name: Mini Evaporation Coater

  • Transport Package: Wooden Box

  • Origin: Zhengzhou, China

  • Type: Coating Spray Gun

  • Substrate: Aluminum

  • Condition: New

  • Tungsten Heater : Carbon Fiber String

  • Trademark: CY

  • Specification: max. coating area: 45mm

  • HS Code: 8543709990

Compact Vacuum Spin Coater with Vacuum Chucking Cy-Sp4
Compact Vacuum Spin Coater with Vacuum Chucking Cy-Sp4 Image

CY-SP4 spin coater is a high performance compact spin coater. It is designed for high uniformity thin material coatings. With its small footprint, the spin coater can be installed in a fume hood or a glove box. The upgraded program can store up to five recipes and each recipe could be edited with five spin steps.

  • Model NO.: CY-SP4

  • Coating: Spinning

  • Certification: CE

  • Max. Speed: 10,000 Rpm

  • Warranty: 1 Year

  • Transport Package: Wooden Case

  • Origin: China

  • Type: Spin Coater

  • Substrate: Ceramic

  • Condition: New

  • Max Spin Time: 3,000 S

  • Trademark: cyky

  • Specification: spin coater

  • HS Code: 8486109000

Programmable Desktop Lab Wafer Spin Coater with Vacuum Chuck and Complete Accessories
Programmable Desktop Lab Wafer Spin Coater with Vacuum Chuck and Complete Accessories Image
  • Model NO.: CY-VTC-200P

  • Coating: Vacuum Coating

  • Condition: New

  • Chamber: Anti-Corrosive

  • Warranty: One Year

  • Transport Package: Wooden Box

  • Origin: Zhengzhou, China

  • Type: Powder Coating Booth

  • Substrate: Ceramic

  • Structure: Polypropylene

  • Motor: Brushless

  • Trademark: CY

  • Specification: chamber dia. 150mm

  • HS Code: 85141090

Laboratory Flexible Metal Foil Electrode Preparation 1200 Celcius Single/Multi Heating Zone Double Tube Slide CVD System
Laboratory Flexible Metal Foil Electrode Preparation 1200 Celcius Single/Multi Heating Zone Double Tube Slide CVD System Image

Laboratory Flexible metal foil electrode preparation 1200 celcius Single/Multi Heating zone

  • Model NO.: CY-O1200-100IT-S3ZD

  • Certification: TUV

  • Brand: Cyky

  • Specification: O. D100*400mm heating zone

  • HS Code: 85143090

  • Type: CVD Film Preparation

  • Structure: Horizontal Type

  • Transport Package: Standard Ply Wooden Box

  • Origin: Zhengzhou, China

DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater
DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater Image
  • Model NO.: CY-VTC-600-2HD

  • Coating: Plasma Sputtering Coater

  • Certification: CE

  • Product Name: DC/RF Dual-Head Magnetron Plasma Sp

  • RF Source: 300W

  • Transport Package: Wooden Case

  • Origin: China

  • Type: Coating Production Line

  • Substrate: Ceramic and Metal

  • Condition: New

  • DC Source: 500W

  • Trademark: CYKY

  • Specification: plasma sputtering system

33 products«1 of 3»
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor Image
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor
VTC-600-2HD is a compact magnetron sputtering system with dual 2″ target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enabl... Read More
Specifications:Dual-Head Magnetron Plasma Sputtering system / Magnetron Sputter Coater Brief introduction VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. at low cost.
Input Power220VAC 50/60Hz, single phase
2000W (including pump)
Source PowerTwo sputtering power sources are integrated into one control box
DC source: 500W for coating metallic materials
RF source: 600W with automatching for coating non-metallic materials ( Center)
Compact 300 RF source is available at extra cost
Magnetron Sputtering HeadTwo 2" Magnetron Sputtering Heads with water cooling jackets are included
One is connected to RF power supply for no-conductive materials
Another is connected to DC sputtering power source for coating metallic materials
Target size requirement: 2" diameter
Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets
One stainless steel and one Al2O3 ceramic targets are included for demo testing
Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled recirculating water chiller is included for cooling both magnetron sputtering heads
Customized coater: Two DC head without, RF sputtering, RF head without DC sputtering, 3 RF head are available upon request
Vacuum
Chamber
Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
Observation Window: 100 mm diameter
Hinged type cover on top with air spring sport makes target exchange easy
Sample HolderSample holder size: 140mm dia. for. 4" wafer max 
(also can be designed as your requirement)
Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow
Control
Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
Flow rate: 200 ml/min max.
Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump
Station
High speed turbo vacuum pump system (made in Germany) is directly installed on the vacuum chamber for max. vacuum level
Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed
Mobile pump station is included and the compact sputtering coater can be put on top of station
Max. vacuum level: 10^-6 torr with chamber baking
Thickness
Monitor
One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å
LED Display Unit outside chamber can:5 pcs quartz sensors (consumable) are included
Input material to be coated according to data base included
Display total thickness coated and coating speed
Water cooling is required
Overall
Dimensions
L1300mm× W660mm× H1200mm
Net Weight160 kg
WarrantyOne years limited warranty with lifetime support
Application NoteIn order to remove oxygen from the chamber, suggest you use 5% Hytrogen + 95 % Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm
Please use > 5N purity Argon gas for plasma sputtering. Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O
Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-Ktq-100 Image
Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-Ktq-100
Description of the micrometer adjustable film applicator:Adjustable Film Applicator – This unique wet film applicator features micrometer heads for knife blade adjustment. Model NO.:&nbs... Read More
Specifications:

Micrometer Adjustable Film Applicator - 100 mm (Film casting doctor blade) - EQ-Se-KTQ-100

Description of the micrometer adjustable film applicator:Adjustable Film Applicator - This unique wet film applicator features micrometer heads for knife blade adjustment.
The operator sets the blade clearance by adjusting the micrometers. This is excellent tool to make quality film for material research laboratories to make ceramic tape casting, battery electrodes, and various coating at lower cost. Stainless steel knife blade with precision ground edge.

Specification of the micrometer adjustable film applicator:

Features
  • 100 mm standard width

  • Make wet film thickness between 0 - 3500 microns 

  • Micrometer head's controllable accuracy is 10 microns 

  • Made of SS304 stainless steel

4 Paths Micron Precision Film Applicator Cy-EQ-Se-Ktq-4s Image
4 Paths Micron Precision Film Applicator Cy-EQ-Se-Ktq-4s
Zhengzhou CY Scientific Instrument Co., Ltd.-founded in 2013 is a high and new technology enterprise registered in Zhengzhou,Henan province. We mainly supply the lab instruments for material research in labs like the cutting machine, mi... Read More
Specifications:

4 Paths Micron Precision Film Applicator CY-EQ-Se-KTQ-4S

Description of the film applicator:
This is fixed thickness precision film applicator with four paths of 5μm,10μm,15μm and 20μm , which is designed for making thin film coating at small quantity.

Specification of film applicator:

Specifications
  • For coating 5 micron thin coating, you must use automatic coater as Pic of below- left, and use slow speed < 10 mm/min

  • For using our automatic coater, customized Traverse Pusher needer to ensure the constant coating speed. (Please click the link to order customized Traverse Pusher.)

  • For making small quantity of slurry, you may consideer MTI micro-vibration mill or Auto-grindeer as Picd below-right 2

  • In order to make thin coatiing, must adjust  Viscosity by Slurry Viscosity tester ( click Pic below-right to order )

4 Paths Micron Precision Film Applicator Cy-EQ-Se-Ktq-4s
Micrometer Adjustable Film Applicator - 50 mm (Film Casting Knife) - EQ-Se-Ktq-50 Image
Micrometer Adjustable Film Applicator - 50 mm (Film Casting Knife) - EQ-Se-Ktq-50
Micrometer Adjustable Film Applicator – 50 mm (Film Casting Knife) – EQ-Se-Ktq-50 Model NO.: EQ-Se-KTQ-50 Structure: Desktop Certifica... Read More
Specifications:

Micrometer Adjustable Film Applicator - 50 mm (Film Casting Knife) - EQ-Se-KTQ-50

Description of the mircometer film applicator:Adjustable Film Applicator - This unique wet film applicator features micrometer heads for knife blade adjustment. The operator sets the blade clearance by adjusting the micrometers. This is excellent tool to make quality film for material research laboratories to make ceramic tape casting, battery electrodes, and various coating at lower cost. Stainless steel knife blade with precision ground edge.
Specification of the adjustable film applicator:

Features

50 mm standard width        

Make wet film thickness between 0 - 6000 microns          

Micrometer head's controllable accuracy is 10 microns

Demo Video &
Operation instruction
Please click the video below to see how film applicator works on film coater MSK-AFA-II-VC
Application NotesReplacement springs are available for future maintenance, you may consideer micro-vibration mill or Auto-grindeer as Picd below
Gold, Platinum, Indium and Silver Plasma Sputtering Coater Image
Gold, Platinum, Indium and Silver Plasma Sputtering Coater
This is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver etc which can be applied on a sample up to 50 mm diameter with 300 Angstrom thickness. ... Read More
Specifications:

Plasma Sputtering Coater
This is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver  etc which can be applied on a sample up to 50 mm diameter with 300 Angstrom thickness. 
  
specification of the plasma sputtering coater:

Model:CY-GSL1100X-SPC16  Plasma Sputtering Coater
Main Feature:1. Sample sputtering chamber vacuum gauge and sputtering ampere meter, to indicate and monitor instrument condition
2. Sputtering current adjustable controller, micro vacuum gas valve. When working combine with the internal automatic control circuit can easily control the pressure in the vacuum chamber, ionization current and arbitrary select the required ionized gas, to obtain the best coating effect.
3. Particular designed bell edge rubber seal ring, can make sure to have a long term usage and can't appear the "brokenedge"phenomenon to effect the sample sputtering chamber vacuum degree;
4. Ceramic seal high pressure head is more durable than the rubber seal.
5. According to gas ionization character in the electric field, using the high-capacity sample sputtering chamber and corresponding area sputtering target, to make the coating film more uniform and pure.
Technical
Parameter:
1. Target(upper electrode):Diameter:45mm, Thickness:0.12mm
2. Vacuum specimen chamber:Diameter:160mm, Height:120mm
3. Sputtering area:Ф50mm with adjustable height
4. Vacuum gauge:Max. vacuum degree:≤4X10-2 mbar
5. Plasma ampere meter:Max. current:50mA
6. Timer:Longest time:900S
7. Compact vacuum valve:can connect withφ3mm flexible tube
8. Allowed gas:all kinds
9. Max. voltage:-1600(-3000)DCV
10. Mechanical pump:2L/S
Optional 
Accessories :
All kinds of target materials
Low Vacuum Laboratory Mini CVD Tube Furnace with Three Gas Channels Image
Low Vacuum Laboratory Mini CVD Tube Furnace with Three Gas Channels
Model NO.: CY-1200CVD  Structure: Desktop Certification: CE, TUV Type: Heating Type Tube Material:&nbs... Read More
Specifications:

CYKY mini CVD tube furnace with 3 MFCS / CVD furnace system

The CY-1200CVD series furnace workstation consists of a CY-O1200 series mini  tube furnace,a precision mass flow gas control station, a high vacuum station and other assembling parts. The max. working temperature of this workstation is 1200C. The ultimate vacuum rate goes to 10^-5 torr .The mass flow gas control station mixes three kinds of gas together and input the mixed gas into a fused quartz tube inside the furnace. It is competent for the experiments as CVD, Diffusion and other thermo-treatments under vacuum status and shielding gas protected.

ProductCY-1200CVD  system 
Chamber TypeSplit Chamber
DisplayLED digital display
Chamber MaterialAlumina Fiber
Heating Element Resistance wire
Max Temperature1200°C
Usable Range≤1100°C
Heating Rate≤20°C(suggestion:10°C/min)
Heating ZoneSingle
Heated length220mm
Length constant temperature100mm
Tube MaterialHigh purity quartz
Tube SizeΦ50mm x700mm
Vacuum Seal1.03×10-3Pa
Temperature ControlPID automatic control via SCR power control
Accuracy±1°C
Preset curve10
ThermocoupleK Type
Working Voltage220V 50Hz~60Hz
Max. Power1.8KW
Gas Channels3 gas channels (can be designed as your requirement)
Gas controller MFCS with range of 0 -500 sccm 
Vacuum pump 10 Pa Rotary vacuum pump
10(-4) Pa high vacuum pump system
1200c Compact Magnet Driven Sliding Tube Furnace for Two Dimension Material Image
1200c Compact Magnet Driven Sliding Tube Furnace for Two Dimension Material
Model NO.: CY-OTF-1200X-S-DVD  Structure: Desktop Certification: CE, TUV Type: Heating Type Max.Heatin... Read More
Specifications:

1200C Compact Magnet Driven Sliding Tube Furnace for DVD & RTP / atmosphere tube furnace
 
OTF-1200X-S-DVD is a compact magnet driven sliding 2" tube furnace with a max. working
temperature of 1200°C, which is designed for direct vaporizing deposition (DVD) or rapid thermal processing (RTP) under various atmosphere for 2D material growth. 
  
Specification

 

Furnace FeatureOne high thermal conductivity AlN flat sample holder (2"Lx1"W) is fixed on 
K type sample, andthe thermal couple with the sample holder can be moved inside quartz tube 
driven by a 
magnet manually to find desirable temperature position inside tube for 
evaporation or deposition. 
One NIST certified precision temperature monitor is connected to thermal 
couple and 
sample holder via a feedthrough on the vacuum flange.
One magnet is embedded inside thermal block, and another magnet is 
placed outside tube.
 move the outside magnet can move the sample holder with thermal couple 
inside tube in or out
30 segment programmable temperature controller is built in furnace to set 
up max. 
working temperature up to 1200oC at center of furnace
One small quartz crucible is included , which can be used to contain 
evaporation material or
 please wafer on top for deposition based on your application.
Furnace Power 110VAC or 208 - 240 VAC, 50/60Hz (Please confirm voltage when place order )
1.5 KW
Max. Temperature 1200°C (<1 hour) 
Continuous 
Temperature 
1100°C ( continuous) 
Max. Heating Rate <= 20 °C/min
Heating ZoneHeating Zone Length: 8" (200mm), single zone. The following picture shows 
the temp. 
distribution across the heating zone, please click to enlarge.
Constant Temp. Zone: 2.3" (60mm) (+/-1°C) @ 1000 °C 
You shall measure furnace temperature profile for your own application 
before making film growth.
Temperature 
Controller
 PID automatic control via solid state relay with 30 steps programmable
Built in Over Temperature and Thermocouple Failure Protection
Optional: The furnace may be operated by PC with installing a control module.
Temperature 
Accuracy 
+/- 1°C
Heating ElementsFe-Cr-Al Alloy doped by Mo
Tube Size 2" quartz tube (50mm O.D x 44mm I.D x 800mm L) 
Two fibrous ceramic tube blocks are included for blocking heat radiation 
from tube chamber. 
(Ceramic blocks must be fully inserted into the furnace chamber before 
heating)
One small quartz boats is included for placing sample or evaporation 
materials.
Vacuum Flanges2" default flange with 1/4'' Bard fittings, 1/4'' tube feedthrough port 
(for 1/4" O.D thermocouple insert) and a KF25 vacuum port
Vacuum Level10-2torr (by mechanical pump) 
DimensionsWith lid close: 1055mm(L) × 300mm(W) × 400mm(H) With lid open: 
1055mm(L) × 300mm(W) × 560mm(H)
Net Weight 22 Kg 
Shipping 
Package Size
48''(L) x 24''(W) x 28''(H)
Shipping Weight 120 lbs
Warranty One year limited warranty 
ComplianceCE Certified
Split Type Max Dual Sliding Rtp Tube Furnace for Molybdenum Disulfide (MOS2) Research Image
Split Type Max Dual Sliding Rtp Tube Furnace for Molybdenum Disulfide (MOS2) Research
This set of equipment is split vacuum tube furnace and the front end is equipped with pre – heater heated to 400 ºC, the auxiliary sulfur powder evaporation, the rear end of the dual-zone curing oven, precise temperature control, ... Read More
Specifications:

split type Max Dual Sliding RTP Tube Furnace for molybdenum disulfide (MoS2) research
This set of equipment is split vacuum tube furnace and the front end is equipped with pre - heater heated to 400 ºC, the auxiliary sulfur powder evaporation, the rear end of the dual-zone curing oven, precise temperature control, easy to operate. .The left side is equipped with a flange support,preheater and sulphur furnace can be used separately.Right side is equipped with atmosphere micro-adjustment device,which can accurately reflect the gas pressure in the chamber.The regulating valve with a scale,used for low pressure CVD, is very practical and good repeatability.

 Technical parameter

 

Furnace 
Construction
Double layer steel casing with air cooling 
High purity alumina fiber insulation for max. energy saving 
Splitable cover for easy tube replacement 
Power 
Consumption
5 KW
Input Voltage AC 208-240V Single Phase, 50 or 60 Hz 
Maximum 
Temperature 
1200 C 
Continuous 
Temperature 
1100 C 
Maximum 
Heating Rate 
<= 20 C /min 
Heating Zone 
Length
Three zones: (880mm, 35" in total)
Zone 1: 220mm (8.6" )
Zone 2: 440mm (17.3")
Zone 3: 220 mm (8.6")
Constant 
Temperature 
Zone
If three zones are set at the same temperature, constant temperature zone 
is 25" 
(625 mm) long with a temperature discrepancy of +/- 1oC.
If using only one zone (center zone), constant temperature zone is 4.3" 
(110 mm) 
long with a temperature discrepancy of +/- 1oC.
Temperature 
Accuracy
+/- 1oC
Heating 
Elements
Fe-Cr-Al Alloy doped by Mo
Temperature 
Controller
Three precision temperature controllers to control three zones separately.
PID automatic control with 30 programmable segments for precise control 
of heating rate, cooling rate and dwell time.
Built in overheating & broken thermocouple protection.
Over temperature protection and alarm allows for operation without 
attendant(s).
+/- 1 C temperature accuracy.
RS485 Communications Port..
Quartz Tube& 
Sealing Flanges
80 mm O.D x 72 mm ID. x 1400 mm fused quartz tube included. 
Vacuum flanges with valves and pressure gauge are included. 
Thermal block must be placed inside tube as the drawing below 
Vacuum Sealing 
Flanges
Two stainless steel flanges with both vacuum gauge and valves included.
Min. vacuum pressure achieved by mechanical pump is 5.5 m-torr. 
( 5.5x10^-3 torr). 
The pressure can reach 10^-5 torr by using mechanical + molecular pump.
Leaking rate is < 5 m-torr / min. and stable vacuum pressure after 24 hours 
is < 2 torr.
Oxygen MonitoringAn Oxygen Sensor can be used to monitor the oxygen level of gas(es) used 
in CVD systems
 for preventing or reducing oxidation. Please click the picture below to 
learn more:
Vacuum Pump120 L/m Rotary Vane Vacuum Pump is included with max. vacuum pressure
 of 10^-2torr. Stainless steel hose tube is included for connecting to tube 
furnace.
Gas Flow Meter 
and
 Pressure Meter
 
Three gas flow-meters (4% accuracy FS) are installed inside the mobile case 
to 
enable monitoring of gas flowing rates 
Compact direct read flow meter, 10-100 cc/min.
Compact direct read flow meter, 16-160 cc/min.
Compact direct read flow meter, 25-250 cc/min.
ValvesFour stainless steel valves are installed in the side panel of mobile cart to 
control mixing of three inlet gases separately
DimensionsFurnace: 1100 X 450 x 670 mm
Bottom Mobile case: 600x600x597 mm
Ultra-High Vacuum Thermal Evaporation Coater with Four Heating Sources (10-6 torr) Image
Ultra-High Vacuum Thermal Evaporation Coater with Four Heating Sources (10-6 torr)
GSL-1800X-ZF4 is a ultra-vacuum evaporation coater designed for coating oxygen sensitive metallic materials, such as Ti, Al, and Ir etc. It also can be used for coating all kinds of materials. It has four evaporation heater sources and ... Read More
Specifications:

GSL-1800X-ZF4 is a ultra-vacuum evaporation coater designed for coating oxygen sensitive metallic materials, such as Ti, Al, and Ir etc. It also can be used for coating all kinds of materials.  It has four evaporation heater sources and coat two type of materials at the same time at high vacuum up to 10-6 torr.  It is an excellent and cost-effective coating machine for research labs.

Input & Output PowerInput: 208 - 240VAC, 20 A, 50/60 Hz, single phase  Total Power required:  8KW ( including pump)other 3 phase voltage is available upon requestOutput:  5VAC max.  and 300A Max.
Vacuum Chamber
Stainless steel chamber:  280mm ID. x 375 mm Height,(~23Liter)Sand-blasting electrolytic polishing surface  100 mm observation window  in front of chamberHinged type door for easy sample loadingManually operated shutters are on top of each evaporation W boat, which allow evaporating 4 kinds of material one by one4 KF40 ports built in chamber for connecting to necessary device
Vacuum Pump 
High-speed turbo vacuum pump is included and connected to the vacuum chamber.Vacuum speed:600L/SVacuum level:5.0x10-6Torr(after 40 minutes pumping )Limit vacuum:5.0x10-7Torr ( after baking at 100 -150°C)Leaking rate:5.0x10-7 Pa.Vacuum port:150 mm diameter
Evaporation Source & Sample HolderFour tungsten heating boats are included  supported by water cold electrodesTungsten heating boat has dimension 70mm L x 12 mm W x 3 mm H.Each top of boat has a manual operation shutter Built in manual shutter allows evaporation source can be used without contamination100 mm diameter rotating sample holder is on top of the chamber with diameter 260mm, which can be heated up to 600°C max. via digital temperature controller with +/1 °C accuracyThe distance between evaporation source and sample holder is 150-300 mm adjustable      
Thickness control (optional)One High-Resolution Film Thickness Monitor and Controller is optionalThe accuracy of thickness control is 1.0A
Control UnitVacuum, thickness and power control are integrated into one control boxControl Unit is separated from vacuum chamber for easy movingYou may place the control unit on the top of vacuum station 
Overall DimensionsL600mm× W860mm× H1500mm
Net Weight600 kg
Facility Requirement for InstallationSpace:250 SF with height > 6 feetPower:208 - 240V AC, single phase with Max 10KW ( 50A breaker)Water:>15L/minute flowing water required for electrode cooling.
Warranty & CertificateTwo years limited warranty with lifetime support
       CE certified
Multi-Function Coater: Plasma Sputtering+Evaporating+Carbon Coating with Turbo Hi-Vacuum System Image
Multi-Function Coater: Plasma Sputtering+Evaporating+Carbon Coating with Turbo Hi-Vacuum System
GSL-1800X-SBC2 is a floor-stand Multi-Function Film Coater, which integrates thermal evaporating, carbon coating and plasma sputtering coating into one machine and it can provide the coating for almost every material, including metallic,... Read More
Specifications:

GSL-1800X-SBC2 is a floor-stand Multi-Function Film Coater, which integrates thermal evaporating, carbon coating and plasma sputtering coating into one machine and it can provide the coating for almost every material, including metallic, semiconductive and insulating materials. It is an excellent and cost-effective coating machine for research labs.

SPECIFICATIONS  

Input Voltage220VAC, 10A, 50/60 Hz, single phase  ( < 2500W)
Input Power< 2000W  (including pump)
Output Voltage (DC)AC10V upto 100A Max. for thermal evaporationDC 3KV, 10mA for Plasma sputtering
Vacuum Chamber
Bell Jar made of pyrex glass250mm Dia. x 340mm HeightTwo inner glass tubes are included for radiation blockingOne is 88 mm ID x 140mm H for thermal evaporating The other one is 88 mm ID x 57mm H for plasma sputteringOne stainless steel mesh enclosure is included for blocking light radiation during thermal evaporation
Turbo Vacuum PumpHigh-speed turbo vacuum pump system is installed bottom of the coaterVacuum speed:  600L/SVacuum level:  10e-6 torrEnvironmental working temperature:  < 32°C
Coating Source Assembling
Three sets of coating source assembling are included.                  (1)   Dual heating station for thermal evaporating ( Pic lower left)Can evaporate two kinds of materials in same time.Max. temperature can reach 1800ºC  to evaporate almost all kinds of materials. Tungsten wire resistance heaters are included for immediate use.Spare Tungsten heater is available(2)  One set for carbon coating Assembling two carbon rods are included for immediate use(3)  One set for DC plasma sputteringOne gold target  ( 38mm Dia x 0.12 mm thickness) is included
Control PannelControl Panel allows you choose coating method and adjust sputtering current and evaporation power
Gas atmosphereOne needle valve installed to allow Ar gas flow to achieve better plasma coating
Overall DimensionsL800mm× W560mm× H1340mm
Net Weight150 kg
Shipping Weight & Dimensions400 lbs; 52"x40"x54"
Warranty & CertificateTwo years limited warranty with lifetime support
       CE certified
3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option Image
3 Heads Compact 1" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option
VTC-3RF is a three head 1″ RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxi... Read More
Specifications:

VTC-3RF is a three head 1" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations.

SPECIFICATIONS 

Input Power
 
·Single phase 220 VAC, 50 / 60 Hz
·1000 W (including vacuum pump and water chiller)
Power Source


  
·13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads
·Load range: 0 - 80 adjustable. Tuning range: -200j - 200j adjustable
·The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched "in the plasma" (no breaking of vacuum and plasma during a multilayer process)
·With a DC power supply, the coater can be easily modified into 1" DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations 
·Optional 300 W auto-match RF generator is available at extra cost   
Magnetron Sputtering Head
 
·Three 1" magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
·RF cable replacement can be purchased at CYKY
·One manually operated shutter is built on the flange
·One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads
Sputtering Target·Target size requirement: 1" diameter x 1/8" thickness max
·Sputtering distance range: 50 - 80 mm adjustable
·Sputtering angle range: 0 - 25° adjustable 
·1" diameter Cu target and Al2O3 target are included for demo testing
·Various oxide 1" sputtering targets are available upon request at extra cost
·For target bonding, 1 mm and 2 mm copper backing plates are included.
Vacuum Chamber·Vacuum chamber:  256 mm OD x 238 mm ID x  276 mm Height, made of high purity quartz
·Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring
·Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber
·Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking 
Sample Holder·Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover
·Sample holder size: 50 mm Dia. for. 2" wafer max
·Rotation speed: 1 - 10 rpm adjustable for uniform coating
·The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller
Vacuum Pump  ·KF40 vacuum port is built in for connecting to a vacuum pump.
·Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump
1.0E-5 Torr with optional turbo pump
Size540 mm L x 540 mm W x 1000 mm H
Net Weight60 kg
ComplianceCE approval
Warranty One years limited warranty with lifetime support 
Compact Mini Vacuum Carbon Metal Evaporation Coater Image
Compact Mini Vacuum Carbon Metal Evaporation Coater
Compact Vacuum Carbon & Metal Evaporating Coater machine Brief introduction CY-1100X-SPC-5E is a compact evaporating coater, which is suitable for coating light metal, Al. Mg, and Li as well as carbon film to sample upto 2R... Read More
Specifications:

Compact Vacuum Carbon & Metal Evaporating Coater machine  
Brief introduction CY-1100X-SPC-15E is a compact evaporating coater, which is suitable for coating light metal, 
Al. Mg, and Li as well as carbon film to sample upto 2" wafer
 
Specification  

Input VoltageAC110V 60Hz and AC220V 50Hz selectable in option bar
Input Power< 1000 W
Specimen chamberFused glass tube, 160 mm Dia. x 110mm Height
Specimen stageOne 50 mm Dia.sample stage, Max. coating area: 45 mm dia
Evaporating fixture 3 tungsten heaters are included
Tungsten Heater 3 pcs tungsten heating coils, a carbon fiber string (3 ft long) 
for use as the source of carbon evaporation, and spare fuses are included. 
Extra spare tungsten heater is available 
If you need other evaporation materials, please contact use, we may supply or recommend a source for you
OptionalKF25 port is built in the coater to connect a vacuum pump. 
Vacuum pump is required for coating ( not included ). Please click Pic below to choose 
Double Stage Rotary Vane Vacuum Pump with Vapor trap eliminates the oil mist, 

which can reach vacuum upto 10-2 torr for evaporating noble metallic materials , such as 

Gold, silver

Compact Turbo-molecular Vacuum Pump System (up to 1E-7 mbar) is able to provide vacuum level up to 1.05 x 10^-5 for evaporating oxygen sensitive materials, such as Al. Mg, Li etc
Overall dimensionL360mm x W300mm x H380mm
Application NotesFor long term usage, working current should be kept below 40A
For evaporating materials with low vapor rate, 30A working current is good enough
Net Weight50 kg
Warranty & CertificateOne year limited with lifetime support CE certified
Compact Vacuum Spin Coater with Vacuum Chucking Cy-Sp4 Image
Compact Vacuum Spin Coater with Vacuum Chucking Cy-Sp4
CY-SP4 spin coater is a high performance compact spin coater. It is designed for high uniformity thin material coatings. With its small footprint, the spin coater can be installed in a fume hood or a glove box. The upgraded program can s... Read More
Specifications:

compact vacuum spin coater 
Description of the spin coater:
CY-SP4 spin coater is a high performance compact spin coater. It is designed for high uniformity thin material coatings. With its small footprint, the spin coater can be installed in a fume hood or a glove box. The upgraded program can store up to five recipes and each recipe could be edited with five spin steps.
 
Specification of the spin coater:

 
Model
 
CY-SP4
 
Max Spin Speed
 
10,000 RPM
 
Speed Resolution
 
1 RPM
 
Max Spin Time
 
3,000 S
 
Time Resolution
 
1 S
Chuck diameter5 inches (according to customer's requirement)
 
Max Ramp Rate
 
10,000 RPM/S
 
Dimensions
 
210 mm (W) x 265mm (D) x 215mm (H)
 
Weight
 
6 Kg
 
Power
100-120V,1 Phase,200W(110V)
200-230V,1 Phase,200W(220V)
 
Required Vacuum
0.06-0.09Mpa,Minimum 15L/Min flow rate
 
Vacuum Tubing
 
4mm ID, 6mm OD
 
Fuse
2 A(installed)
Warranty1 year
HS code8486109000
Programmable Desktop Lab Wafer Spin Coater with Vacuum Chuck and Complete Accessories Image
Programmable Desktop Lab Wafer Spin Coater with Vacuum Chuck and Complete Accessories
Model NO.: CY-VTC-200P Coating: Vacuum Coating Condition: New Chamber: Anti-Corrosive Warranty: One Ye... Read More
Specifications:

Anti-Corrosion Spin Coater ( 8000 RPM & 6" wafer Max.) with Complete Accessories - VTC-200P

Introduction 

VTC-200P is Anti-Corrosion Spin Coater made of  Polypropylene (PP) material, which can be used for strong acidic or alkali solution, especially suitable for use inside glovebox under Ar gas.   Four vacuum chucks are included for coating wafer  from 10 mm to  6".  Digital control box is separated from spin coater which allow you operate in the remote location. The spinning speed is variable from 500-8000 rpm with two programmable segments. The package includes the oilless vacuum pump and 20ml syringe for immediate use.  
 
Specification

 

Structure
  
Case and spin disk made of PolypropylenePolypropylene (PP) to resist most of the corrosive solutions.
Digital control box is separated from spin coater.
One filter is included in standard package. It is used to connect the pump and coater for preventing waste water from flowing into the pump.
One oil-less vacuum pump is included in the standard package

Input Power
Default 220VAC, 50/60Hz,  single phase, 1000W Max.
110V is available in optional bar ( with 1500W transformer )
A power socket on the back of the Digital control box is used to supply power for the vacuum pump. (The output voltage of this power socket depends on the input voltage of the spin coater, e.g. if the spin coater is plugged into AC 110V, this power socket will supply AC 110V.)


Chamber  &Vacuum Chuck
Chamber diameter:  150 mm
4 sets of PP anti-corrosive vacuum chucks with different sizes ( Φ21mm,Φ38mm,Φ60mm,Φ100mm ), which can hold substrate from 10mm Dia to 6" Dia.
If your sample < 10 mm, please order rubber cup from us at extra cost

Spin Speed
Digital control panel with two programmable segments of different spin times and speeds
500 - 8000 RPM adjustable spinning speed  at each segment


Liquid Injecting
20mL syringe is included to contain the coating material.
Optional:  
You may choose Precision Electronic Single Channel Pipette: 20 - 200uL for more accurate coating
Using plasma cleaner to treat substrate surface before coating can improve film quality
You may consider our new product: Heatable syringe  
 
Motor 24VDC, Brushless,  200W max.:
Product Dimensions
 
Spin Coater:       25.2cm(Φ) x 41cm(H)
Digital controller: 23cm(L) x32cm(W) x16cm(H)
Net Weight25 kg 
ComplianceCE Certified
WarrantyOne year limited with lifetime support
Laboratory Flexible Metal Foil Electrode Preparation 1200 Celcius Single/Multi Heating Zone Double Tube Slide CVD System Image
Laboratory Flexible Metal Foil Electrode Preparation 1200 Celcius Single/Multi Heating Zone Double Tube Slide CVD System
Laboratory Flexible metal foil electrode preparation 1200 celcius Single/Multi Heating zone Model NO.: CY-O1200-100IT-S3ZD Certification: TUV Bra... Read More
Specifications:

Double Tube Slide CVD system

Name1200ºC Double Tube Single/Multi zone Slide CVD System
Model No.CY-O1200-100IT-S3ZDCY-O1200-100IIT-S3ZDCY-O1200-100IIIT-S3ZT
Max Temper1200ºC
Heating zone420mm610mm940mm
Constant zone210mm400mm700mm
Heating zoneSingle zoneDouble zoneThree zone
Quartz diameterInner diameter:Φ80mm  Outer diameter:Φ100mm
Rated power2.5Kw4.8Kw7.2Kw
Rated voltage220V220V380V(three phase)
Sliding distance290mm485mm650mm
Sliding methodManual/Auto programmable control
Temperature controlPID Programmable control, 30 steps curves
Temperature accuracy±1ºC
Double Tube Sealing FlangeAdopt double flange extensible multi-function double clamp connection,and independently inner tube and outer tube for vacuum and gas flow control.
Gas Control MethodMass Flow Controller
Gas way3 gas way
Flow speed range0-500sccm, or as customized
Accuracy±1%F.S
Response time≤4sec
Working surrounding temperature5-45ºC
Working pressureInlet Pressure 0.05-0.3Mpa
Vacuum range10Pa-100Pa1x10-3Pa-1x10-1Pa
Vacuum pumpDouble stange
mechanical pump,
Vacuum:3x10-1Pa,
Pump speed:4L/S,
Turbo pump set
Vacuum:5x10-6Pa
Pumping speed:1600L/S
Outer dimension530×1440×750mm530×1440×750mm
Gross weight240Kg340Kg
DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater Image
DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater
Model NO.: CY-VTC-600-2HD Coating: Plasma Sputtering Coater Certification: CE Product Name: DC/RF Dual-Head Magnetron Plasma ... Read More
Specifications:

Product DescriptionDC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater
 
CY-VTC-600-2HD is a compact magnetron sputtering system with dual 2"  target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of  materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE  etc.  at low cost.
 
Specification of the dual head magnetron plasma sputtering coater
 

Input Power220VAC 50/60Hz, single phase
2000W (including pump)



Source Power
Two sputtering power sources are integrated into one control box 
DC source: 500W for coating metallic materials 
RF source: 300W for coating non-metallic materials







Magnetron Sputtering Head
Two 2" Magnetron Sputtering Heads with water cooling jackets are included
One is connected to RF source for non-conductive materials
The other one is connected to DC source for coating metallic materials
Target size requirement: 2" diameter
Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)
One Cu and one fused SiO2 targets are included for demo testing
Recommend Coating Method<ol list-paddingleft-2">
  • Customized coater: Two DC heads without RF sputtering; two RF heads without DC sputering; 3 RF head are available upon request

  • Optional: 148 cm RF cable is replaceale with extra cost

Vacuum ChamberVacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
Observation Window: 100 mm diameter
Hinged type lid on top with pneumatic power pole makes target exchange easily



Sample Holder
Sample holder size: 140mm dia. for. 4" wafer max
Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control
 
Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
Flow rate: 200 ml/min max. (0-200 SCCM)
Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump Station
 
High speed turbo vacuum pump (made in Germany) is directly installed on the vacuum chamber for max. vacuum level 
Heavy duty dual stage mechanical pump, 220 liters/minute (7.8CFM) is connected to turbo pump for faster pumping speed
Mobile pump station is included and the compact sputtering coater can be placed on top of station
Standard Vacuum Level: < 4x10^-5 Torr . Max. vacuum level: 10^-6 torr with chamber baking
Water Chiller
 
One Digital Temperature Controlled Recirculating Water Chiller is included for cooling both magnetron sputtering heads.
Refrigeration range : 5~35°C
Floowing Rate: 16L/minute


Optionals
Precise quartz Film Thickness Monitor is available upon reuqest to built into the chamber to monitor coating thickness with accuracy 0.10 Å.
Pricesion Thin Film & Coating Analysis Systems with Measurement Capability is available for measure film thickness after coating.

Overall Dimensions

Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37"
Net Weight200 kg
WarrantyOne years limited warranty with lifetime support
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