Plasma Cleaner

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Plasma Cleaning Machine
Plasma Cleaning Machine Image

Plasma cleaning machine divided into two types, atmospheric and vacuum; it is widely used in semi-conductor, PCB, medical diagnosis, elastomer industry, optical industry,etc.

RF generator has 40KHz, 13.56Mhz, and 2.45GHz. According to the usage, can choose the suitable RF

Plasma Cleaner
Plasma Cleaner Image

<ul>
<p><strong>Featrues</strong></p><p>1. Environmental technologies: plasma process is the role of gas – solid
coherent reactor consumes no water resources, no need to add chemicals and no
environmental pollution.</p><p>2. Wide adaptability: regardless of processing substrate type, such as
metals, semiconductors, oxides, and most of the polymer material can be a good
deal;</p><p>3. Low temperature: close to room temperature, particularly suitable polymer
materials, have a longer retention time and a higher surface tension than the
corona and flame method.</p><p>4. Multi-function: it involves only a shallow surface of polymer materials
(10 -1000A), while preserving the characteristics of the material itself can
give it one or more new features;</p><p>5. Low cost: the device is simple, easy operation and maintenance, continuous
operation,a few bottles of gas can replace thousands of kilograms cleaning
fluid</p><p>6. The whole process technology can be controlled: all the parameters can be
setted by the computer and data recording</p><p>7. Treated geometry Unlimited: Big or small, simple or complex, parts or
textiles can be processed.</p><p><br></p></ul>

5L Plasma Cleaner
5L Plasma Cleaner Image

<ul>
<p><strong>Featrues</strong></p><p>1. Environmental technologies: plasma process is the role of gas – solid
coherent reactor consumes no water resources, no need to add chemicals and no
environmental pollution.</p><p>2. Wide adaptability: regardless of processing substrate type, such as
metals, semiconductors, oxides, and most of the polymer material can be a good
deal;</p><p>3. Low temperature: close to room temperature, particularly suitable polymer
materials, have a longer retention time and a higher surface tension than the
corona and flame method.</p><p>4. Multi-function: it involves only a shallow surface of polymer materials
(10 -1000A), while preserving the characteristics of the material itself can
give it one or more new features;</p><p>5. Low cost: the device is simple, easy operation and maintenance, continuous
operation,a few bottles of gas can replace thousands of kilograms cleaning
fluid</p><p>6. The whole process technology can be controlled: all the parameters can be
setted by the computer and data recording</p><p>7. Treated geometry Unlimited: Big or small, simple or complex, parts or
textiles can be processed.</p><p><br></p></ul>

10L 13.56MHz Plasma Cleaner
10L 13.56MHz Plasma Cleaner Image

<ul>
<p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”><strong>Featrues</strong></span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>1. Environmental technologies: plasma process is the role of gas – solid
coherent reactor consumes no water resources, no need to add chemicals and no
environmental pollution.</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>2. Wide adaptability: regardless of processing substrate type, such as
metals, semiconductors, oxides, and most of the polymer material can be a good
deal;</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>3. Low temperature: close to room temperature, particularly suitable polymer
materials, have a longer retention time and a higher surface tension than the
corona and flame method.</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>4. Multi-function: it involves only a shallow surface of polymer materials
(10 -1000A), while preserving the characteristics of the material itself can
give it one or more new features;</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>5. Low cost: the device is simple, easy operation and maintenance, continuous
operation,a few bottles of gas can replace thousands of kilograms cleaning
fluid</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>6. The whole process technology can be controlled: all the parameters can be
setted by the computer and data recording</span></p><p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”>7. Treated geometry Unlimited: Big or small, simple or complex, parts or
textiles can be processed.</span></p><p><br></p></ul>

Plasma Cleaning Machine Image
Plasma Cleaning Machine
Plasma cleaning machine divided into two types, atmospheric and vacuum; it is widely used in semi-conductor, PCB, medical diagnosis, elastomer industry, optical industry,etc. RF generator has 40KHz, 13.56Mhz, and 2.45GHz. Accordin... Read More
Specifications:
Model No.CY-P2L
Product Name2L Plasma Cleaner
Display

LCD touch controller

Plasma Cleaning Machine

Working voltageAC 220V, 50Hz
RF Frequency40KHz (13.56MHz for optional)
Coupled modecondenser coupling, without pollute sample
RF power200 w
RF offset< 0.2KHz
Characteristic impedance50Ω, automatic matching
Vacuum degree

10-100Pa, equipped with a mechanical pump

Plasma Cleaning Machine

If request high vacuum, please select our turbo pump system

Plasma Cleaning Machine

(Optional)

Gas speed

Two way Float Flow Gas Control10-100ml/min, adjustable

Plasma Cleaning Machine

Control

PLC Touch Panel Program controlAuto/Manual two mode for optional

Plasma Cleaning Machine

Inner chamber size

 Stainless Steel Chamber with Φ 100*270mm

Plasma Cleaning Machine

If Chamber is not enough for using, we have Φ 150*270mm (capacity: 5L)200* 200*260mm (capacity: 10L)for optional

Pressure Gauge

A simple digital pressure gauge is equipped for reading

Plasma Cleaning Machine

If request high precision vacuum reading, please select digital vacuum gauge:

Plasma Cleaning Machine

(Optional)

Cooling wayForced cooling
Outer dimension440*390*200mm
Gross weight35 kg
Time of delivery10 working days after receive the payment
Plasma Cleaner Image
Plasma Cleaner
<ul> <p><strong>Featrues</strong></p><p>1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals... Read More
Specifications:
Power supply:AC220V
Working current:Total working current not higher than1.2A (Not include the vacuum pump)
RF Power:200W
Radio frequency:40KHZ(offset less than 0.2Hz)
Frequency offsetLess than 0.2KHz
Characteristic impedance:50 Ohm,Automatic matching
Vacuum degree:30Pa—100Pa
Gas flow:10—100ml/min(Adjustable)
Process Control:MCU Automatic and manual mode
Cleaning time:1-6000 secds adjustable
Power supply:10%-100% Adjustable
Inside chamber size100mm×270mm
Outside dimension:440*390*200mm
Weight:25Kg
Vacuum chamber temperatureLess than 65°C
Cooling type:Forced cooling
5L Plasma Cleaner Image
5L Plasma Cleaner
<ul> <p><strong>Featrues</strong></p><p>1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals... Read More
Specifications:
Power supply:AC220V
Working current:Total working current not higher than1.2A (Not include the vacuum pump)
RF Power:200W
Radio frequency:13.56MKHZ(offset less than 0.2Hz)
Frequency offsetLess than 0.2KHz
Characteristic impedance:50 Ohm,Automatic matching
Vacuum degree:30Pa—100Pa
Gas flow:10—100ml/min(Adjustable)
Process Control:MCU Automatic and manual mode
Cleaning time:1-6000 secds adjustable
Power supply:10%-100% Adjustable
Inside chamber size150mm×270mm
Outside dimension:480*390*350mm
Weight:45Kg
Vacuum chamber temperatureLess than 65°C
Cooling type:Forced cooling
10L 13.56MHz Plasma Cleaner Image
10L 13.56MHz Plasma Cleaner
<ul> <p><span style=”font-size: 16px; font-family: arial, helvetica, sans-serif;”><strong>Featrues</strong></span></p><p><span style=”font-size: 16px; font-family... Read More
Specifications:
Power supply:AC220V
Working current:Total working current not higher than1.2A (Not include the vacuum pump)
RF Power:200W
Radio frequency:13.56MKHZ(offset less than 0.2Hz)
Frequency offsetLess than 0.2KHz
Characteristic impedance:50 Ohm,Automatic matching
Vacuum degree:30Pa—100Pa
Gas flow:10—100ml/min(Adjustable)
Process Control:MCU Automatic and manual mode
Cleaning time:1-6000 secds adjustable
Power supply:10%-100% Adjustable
Inside chamber size200mm×320mm
Outside dimension:600*600*780mm
Weight:45Kg
Vacuum chamber temperatureLess than 65°C
Cooling type:Forced cooling